首页> 外国专利> -- ZTO TFT High Performance Solution-Processed Zinc-Tin-Oxide Thin-Film Transistors Employing Ferroelectric Copolymers Fabricated at Low Temperature for Transparent Flexible Displays and encapsulation process method of ZTO TFT device using fluoroploymer thin film

-- ZTO TFT High Performance Solution-Processed Zinc-Tin-Oxide Thin-Film Transistors Employing Ferroelectric Copolymers Fabricated at Low Temperature for Transparent Flexible Displays and encapsulation process method of ZTO TFT device using fluoroploymer thin film

机译:-采用低温制造的铁电共聚物的ZTO TFT高性能溶液处理锌锡氧化物薄膜晶体管,用于透明柔性显示器以及采用含氟聚合物薄膜的ZTO TFT器件的封装工艺方法

摘要

The present invention provides a high-performance solution-processed zinc-tin-oxide thin film transistor (ZTO TFT) applying a ferroelectric copolymer produced at low temperatures of 100°C or lower for a transparent flexible display using a charge-screening method, and an encapsulation process method of a ZTO TFT device using a fluoropolymer thin film as a protection layer. A semiconductor device encapsulation process using the fluoropolymer thin film as the protection layer is used to improve characteristics of ZTO TFTs using a metal oxide semiconductor material, and a fluoropolymer (PVDF-TrFE) composed of a carbon-fluorine dipole bond is used to improve electric/electronic characteristics of the ZTO TFTs through passivation using a low temperature solution process.
机译:本发明提供了一种高性能溶液处理的氧化锌锡氧化物薄膜晶体管(ZTO TFT),其应用在100℃或更低的低温下生产的铁电共聚物用于通过电荷屏蔽法的透明柔性显示器,以及一种使用含氟聚合物薄膜作为保护层的ZTO TFT器件的封装工艺方法。使用含氟聚合物薄膜作为保护层的半导体器件封装工艺用于改善使用金属氧化物半导体材料的ZTO TFT的特性,并且使用由碳氟偶极键组成的含氟聚合物(PVDF-TrFE)来改善电气性能通过使用低温溶液工艺进行钝化来实现ZTO TFT的/电子特性。

著录项

  • 公开/公告号KR20180136324A

    专利类型

  • 公开/公告日2018-12-24

    原文格式PDF

  • 申请/专利号KR20170075125

  • 发明设计人 HA TAE JUN;

    申请日2017-06-14

  • 分类号H01L51/05;H01L29/786;H01L51;H01L51/10;H01L51/52;H01L51/56;

  • 国家 KR

  • 入库时间 2022-08-21 11:52:15

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