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Drain-conductance optimization in nanowire TFETs

机译:纳米线TFET中的漏极电导优化

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摘要

In this work we examine the problem of the nonlinear output characteristics of tunnel FETs, and the related small drain conductance at low drain voltage, which prevents rail-to-rail logic operation and severely degrades the device dynamic properties compared with standard CMOS FETs. The problem is investigated with the help of an analytical model which highlights the constraints of the device design by splitting the effects of the tunneling probability from the density of states in the source, channel and drain, and makes it possible to design a nanowire TFET by an appropriate selection of the material, nanowire size and degeneracy levels in the source and drain regions. So doing, we remove the above characteristics' feature and recover a large drain conductance without degrading the subthreshold slope. The optimized device is numerically simulated using the k·p model, whose results are in fair agreement with the analytical one.
机译:在这项工作中,我们研究了隧道FET的非线性输出特性以及在低漏极电压下的相关小漏极电导的问题,与标准CMOS FET相比,这会阻止轨到轨逻辑操作并严重降低了器件的动态性能。通过分析模型来研究该问题,该模型通过将隧穿概率的影响与源极,沟道和漏极中的状态密度分开来突出器件设计的约束,并可以通过以下方法设计纳米线TFET:在源区和漏区中适当选择材料,纳米线尺寸和退化水平。这样一来,我们就消除了上述特征,并恢复了较大的漏极电导,而不会降低亚阈值斜率。使用k·p模型对优化后的设备进行了数值模拟,其结果与分析模型相吻合。

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