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首页> 外文期刊>Materials science in semiconductor processing >Optimization of InAs/GaSb core-shell nanowire structure for improved TFET performance
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Optimization of InAs/GaSb core-shell nanowire structure for improved TFET performance

机译:INAS / GASB芯壳纳米线结构的优化,提高TFET性能

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摘要

The performance of InAs/GaSb core-shell nanowire TFET is systematically investigated for the effects of intrinsic device parameters such as channel doping, shell thickness, spacer length and source offset. Device ON-current (I-ON) was chosen as the key figure of merit. It is found that I-ON improves due to improved electrostatic control achieved by the TFET with optimum shell diameter. The maximum I-ON obtained for a shell thickness of 2 nm was 33.65 mu A/mu m and a Subthreshold Swing (SS) of 12.9 mV/decade with an I-ON/I-OFF ratio of 1.49 x 10(8) for our device. Device I-ON can be further improved by adding an optimum spacer at the source-channel junction. It was also found that device ON-current is almost constant and does not get much affected by having a larger shell offset.
机译:系统地研究了INAS / GASB核心 - 壳纳米线TFET的性能,用于诸如通道掺杂,壳体厚度,间隔长度和源偏移的内在装置参数的效果。 选择电流(I-ON)作为优点的关键图。 发现I-ON由于TFET实现具有最佳壳体直径的改进的静电控制而改善。 壳体厚度为2nm的最大I-ON为33.65μA/ mu m和12.9 mV /十年的亚阈值摆动(SS),I-ON / I-OFF比率为1.49 x 10(8) 我们的设备。 通过在源通道结处添加最佳隔离物,可以进一步改善设备I-ON。 还发现设备电流几乎是恒定的,并且通过具有更大的壳偏移不会得到很大的影响。

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