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Design and analysis of a new sub-threshold DTMOS SRAM cell structure

机译:新型亚阈值DTMOS SRAM单元结构的设计与分析

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摘要

In this paper, we propose a novel dynamic threshold (DTMOS) based fully differential ten-transistor (10T) SRAM (Static Random Access Memory) cell suitable for sub-threshold operation. The structure has two inverters in addition to the conventional 6T standard cell. It provides better read current, increased read and hold static noise margins (SNM) and improved write time compared to a recently proposed sub-threshold SRAM cell. The stability of sub-threshold DTMOS SRAM to process variations is also investigated. The robust dynamic threshold based memory cell exhibits built-in process variation tolerance that gives tight SNM distribution across the process corners.
机译:在本文中,我们提出了一种基于动态阈值(DTMOS)的全差分十晶体管(10T)SRAM(静态随机存取存储器)单元,适合亚阈值操作。除了传统的6T标准单元外,该结构还具有两个逆变器。与最近提出的亚阈值SRAM单元相比,它提供了更好的读取电流,增加了读取和保持静态噪声容限(SNM),并缩短了写入时间。还研究了亚阈值DTMOS SRAM对工艺变化的稳定性。强大的基于动态阈值的存储单元具有内置的过程变化容限,可在各个过程角提供紧密的SNM分布。

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