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SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, CONTROL METHOD FOR SUBSTRATE PROCESSING DEVICE, AND CONTROL METHOD FOR SUBSTRATE PROCESSING SYSTEM
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, CONTROL METHOD FOR SUBSTRATE PROCESSING DEVICE, AND CONTROL METHOD FOR SUBSTRATE PROCESSING SYSTEM
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机译:基板处理装置,基板处理系统,基板处理装置的控制方法,以及基板处理系统的控制方法
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摘要
Provided is a substrate processing apparatus comprising: a substrate support on which a substrate is mounted; a first radio frequency power supply that outputs first radio frequency power with a first frequency to the substrate support; a second radio frequency power supply that outputs second radio frequency power with a second frequency lower than the first frequency to the substrate support; a sensor that detects reflected waves received from the substrate support and a processor that controls the first radio frequency power supply so that an effective power, which is equal to a difference between the power of the reflected waves detected by the sensor and the output power of the first radio frequency power supply, reaches a set value.
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