1278095 Semi-conductor pressure transducers MATSUSHITA ELECTRIC INDUSTRIAL CO Ltd 4 July 1969 [19 July 1968 33791/69 Heading H1K Pressure is applied to a rectifying contact of a semi-conductor body doped with a deep-level impurity through a flat plate coated with insulation at least on its surface adjacent the element. The plate is of metallic silicon or of iron (and its alloys), of nickel (and its alloys), of tungsten, of molybdenum, or of tungsten-molybdenum alloys. In general the plate may be coated with an oxide or nitride by sputtering, may be glazed with a vitreous material, or may be coated with a plastic. In the embodiment, a metallic silicon plate coated by evaporation or thermal oxidation with silicon monoxide or with silica is used to apply pressure to a silicon body doped with copper, gold, iron, cobalt or nickel. Alternative semi-conductor bodies may be made of germanium, gallium arsenide, gallium phosphide, indium arsenide, or cadmium selenide. Though only one contact need be rectifying for D.C. operation, two rectifying contacts are necessary for A.C. use.
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机译:1278095半导体压力传感器MATSUSHITA ELECTRIC INDUSTRIAL CO Ltd 1969年7月4日[1968年7月19日”,标题H1K将压力施加到掺杂有深层杂质的半导体本体的整流触点上,该导体通过涂覆有绝缘层的平板至少在与元件相邻的表面上。该板由金属硅或铁(及其合金),镍(及其合金),钨,钼或钨钼合金制成。通常,该板可以通过溅射用氧化物或氮化物涂覆,可以用玻璃质材料上釉,或者可以用塑料涂覆。在该实施例中,通过一氧化硅或二氧化硅通过蒸发或热氧化涂覆的金属硅板被用来向掺杂有铜,金,铁,钴或镍的硅体施加压力。替代的半导体主体可以由锗,砷化镓,磷化镓,砷化铟或硒化镉制成。尽管仅需一个接触即可进行直流操作,但使用交流需要两个整流触点。
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