首页> 外国专利> SEMICONDUCTOR PRESSURE-ELECTRIC TRANSDUCER INCLUDING A SEMICONDUCTOR ELEMENT HAVING A DEEP LEVEL IMPURITY AND A SEMICONDUCTOR PRESSURE TRANSMITTING PLATE

SEMICONDUCTOR PRESSURE-ELECTRIC TRANSDUCER INCLUDING A SEMICONDUCTOR ELEMENT HAVING A DEEP LEVEL IMPURITY AND A SEMICONDUCTOR PRESSURE TRANSMITTING PLATE

机译:包括深层杂质和半导体压力传输板的包括半导体元件的半导体压力电传感器

摘要

1,271,977. Pressure-sensitive semi-conductor device. MATSUSHITA ELECTRIC INDUSTRIAL CO. Ltd. 4 July, 1969 [19 July, 1968], No. 33792/69. Heading H1K. Pressure is applied to a rectifying contact of a semi-conductor body (doped with a deeplevel impurity) through a flat semi-conductor plate opposite in conductivity type to the body surface. The body may be of silicon doped with copper, gold, iron, cobalt or nickel. Alternative materials for the body are germanium, gallium arsenide, gallium phosphide, indium arsenide, or cadmium selenide (each doped with a deeplevel impurity). The plate may be of silicon or of germanium, gallium phosphide, indium arsenide, or cadmium sulphide. Though only one contact need be rectifying for D.C. operation, two rectifying contacts are necessary for A.C. use.
机译:1,271,977。压敏半导体装置。松下电工产业株式会社,1969年7月4日[1968年7月19日],第33792/69号。标题H1K。压力通过导电类型与主体表面相反的扁平半导体板施加到半导体主体(掺杂有深层杂质)的整流触点上。主体可以是掺杂有铜,金,铁,钴或镍的硅。人体的替代材料是锗,砷化镓,磷化镓,砷化铟或硒化镉(均掺杂有深层杂质)。该板可以是硅或锗,磷化镓,砷化铟或硫化镉。尽管仅需一个接触即可进行直流操作,但使用交流需要两个整流触点。

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