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Apparatus for continuous growth of SiC single crystal from SiC synthesized in a vapor phase without using graphite crucible

机译:在不使用石墨坩埚的情况下由气相合成的SiC连续生长SiC单晶的设备

摘要

A chamber (10) is divided into a reaction zone (20) and a sublimation zone (30). A gaseous mixture (41) is supplied through a conduit (21) into the reaction zone (20) and heated by a heater (27). The components in the gaseous mixture (41) are reacted with each other to synthesize solid-phase SiC (42). The solid-phase SiC (42) is heated and evaporated by a heater (35), and condensed as a single crystal (43) on a seed crystal attached to a mount base (37). The mount base (37) is rotated and lowered in response to the growth of the SiC single crystal (43) by a rotary shaft (38). Since the SiC single crystal (43) grows from SiC synthesized by the vapor-phase reaction, the obtained product is of very high purity without the substantial inclusion of impurities. In addition, a single crystal having a large diameter or length can be obtained without restrictions imposed by the use of a crucible. IMAGE
机译:腔室(10)分为反应区(20)和升华区(30)。气态混合物(41)通过导管(21)供应到反应区(20)中,并由加热器(27)加热。气体混合物(41)中的组分彼此反应以合成固相SiC(42)。固相SiC(42)由加热器(35)加热并蒸发,并在附接到安装基座(37)的籽晶上冷凝为单晶(43)。通过旋转轴(38),随着SiC单晶(43)的生长,使安装基座(37)旋转和降低。由于SiC单晶(43)是由通过气相反应合成的SiC生长而成的,因此所获得的产物具有非常高的纯度而基本上不包含杂质。另外,可以不受使用坩埚的限制地获得具有大直径或长长度的单晶。 <图像>

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