OPERATING METHOD FOR ROTATING/REVOLVING VPE (VAPOR PHASE EPITAXIAL GROWTH) DEVICE

摘要

PURPOSE: To protect gears, and thereby a reactor, against damage by releasing a gear stand at the time of temperature drop of susceptor and tray or pressure reduction in the reactor. ;CONSTITUTION: A susceptor 2 is heated by means of a heating coil 20 while rotating through the rotation of a susceptor revolving shaft 4 thus heating a water 9. A material gas and a carrier gas are then introduced into a reactor 1 through a gas introduction port 21 under that state thus causing vapor phase epitaxial growth on the wafer 9. When the susceptor 2 revolves, a planetary gear 11 for rotating a tray meshes a fixed ring gear 14 to rotate while revolving. Consequently, a tray 8 supporting the wafer 9 on the surface also rotates while revolving. When the temperature of the susceptor 2 and the tray 8 drops during such vapor phase epitaxial growth operation, a lock pin 16 is pulled by means of an operating tool 17 to release a gear stand 13. This constitution prevents excess force from functioning onto the gear mechanism 15 thus ensuring safety in the operation of a rotating/revolving VPE system.;COPYRIGHT: (C)1995,JPO