APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE, MANUFACTURE OF HSG-POLYCRYSTALLINE SILICON FILM AND MANUFACTURE OF CAPACITOR INCLUDING HSG-POLYCRYSTALLINE SILICON FILM AS ELECTRODE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing semiconductor device improved in process uniformity, and method of manufacturing an HSG- polycrystalline Si film and capacitor, including this Si film as an electrode, using the same. ;SOLUTION: The setting position of a wafer holder 220 for mounting a wafer 104 is divided into a wafer loading/unloading position 250, in the order of a stand by position 252 and an in-process position 254 located from the bottom of the apparatus to the top.;COPYRIGHT: (C)1999,JPO