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Method of thinning semiconductor wafer of smaller diameter than thinning equipment was designed for

机译:设计了一种比直径小于薄化设备的直径小的半导体晶片的薄化方法

摘要

A method of thinning a product wafer using equipment designed for a wafer diameter, where the diameter of the product wafer is smaller than the wafer diameter of the thinning equipment by cutting an opening in a template wafer, where the template wafer is of a diameter that may be thinned by the thinning equipment, and where the opening accommodates the product wafer; affixing the template wafer to a holding material; affixing the product wafer to the holding material and inside of the template wafer with the integrated circuit side up; depositing an etch stop onto a handle wafer, where the handle wafer is at least as large as the template wafer; bonding adhesively the product wafer to the etch stop; removing the holding material; filling any gaps between the product wafer and the template wafer; using wax to make the product wafer sufficiently planar; thinning the product wafer using the thinning equipment; removing any excess wax; bonding adhesively the product wafer to a transfer wafer, where the transfer wafer is at least as large as the template wafer; removing the handle wafer; removing the etch stop; and removing any adhesive that remains on the product wafer.
机译:一种使用为晶圆直径设计的设备来减薄产品晶圆的方法,其中产品晶圆的直径小于稀化设备的晶圆直径,方法是在模板晶圆上切割一个开口,其中模板晶圆的直径为可通过稀释设备在开口容纳产品晶圆的位置稀释。将模板晶片固定到保持材料上;将集成电路装配体朝上,将产品晶片固定到保持材料和模板晶片的内部;在处理晶片上沉积蚀刻停止层,其中处理晶片至少与模板晶片一样大;将产品晶片粘合到蚀刻停止层;移走保持材料;填补产品晶圆和模板晶圆之间的间隙;使用蜡使产品晶片足够平坦;使用减薄设备减薄产品晶片;去除多余的蜡;将产品晶片粘合到转移晶片上,其中转移晶片至少与模板晶片一样大;取出处理晶片;去除蚀刻停止;并清除产品晶圆上残留的任何粘合剂。

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