Process for producing thin film gas sensors with dual ion beam sputtering

摘要

The present invention provides processes for making stoichiometric, highly electrically resistant and crystalline gas-sensing layer of SnO₂ thin-film for stable detection of reducing gases. It also provides processes for making stoichiometric and crystalline thin film CuO catalytic layer for the detection of dilute sulfur compound gases. The sensing layer is made using dual ion beam sputtering, where an argon ion beam sputters targets comprising Sn or its oxides, and a pure or highly concentrated oxygen ion beam is simultaneously deposited on a substrate. It also provides processes for making stoichiometric and crystalline thin film CuO catalytic layer for detection of dilute sulfur compound gases. The catalytic layer is made using dual ion beam sputtering, where an argon ion beam sputters targets comprising Cu or its oxides, and a pure or highly concentrated oxygen ion beam is simultaneously deposited on a substrate. The effect of the oxygen assist ion beam and the resulting stoichiometric, dense and crystalline thin films are important parts of the present invention.