Dual ion beam sputtered TCO thin films: Sputter-instigated plasmonic features for ultrathin photovoltaics

摘要

Electrical and optical properties of dual ion-beam sputtered (DIBS) Ga-doped ZnO (GZO) and Ga-doped MgZnO (GMZO) individual films are analyzed. Usage of secondary ion source favors excitation of sputter-instigated plasmonic feature in individual thin film. The plasmonic feature observed in GZO and GMZO thin films due to the formation of metal and metal oxide nanoclusters. The plasmon generation is verified by electron energy loss spectra obtained by ultraviolet photoelectron spectroscopy, spectroscopic Ellipsometry, and field emission scanning-electron microscopy measurements. This is promising in terms of increasing the efficiency of ultrathin solar cells by increasing optical path length in the absorbing layer.