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Method and the device in order to form the schedule for wafer processing inside multiple chamber type semiconductor wafer processing tool automatically
Method and the device in order to form the schedule for wafer processing inside multiple chamber type semiconductor wafer processing tool automatically
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机译:在多室型半导体晶片加工工具内自动形成晶片加工时间表的方法和装置
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摘要
A method and apparatus for producing schedules for a wafer in a multichamber semiconductor wafer processing tool comprising the steps of providing a trace defining a series of chambers that are visited by a wafer as the wafer is processed by the tool; initializing a sequence generator with a value of a variable defining initial wafer positioning within the tool; generating all successor variables for the initial variable value to produce a series of values of the variable that represent a partial schedule; backtracking through the series of variables to produce further partial schedules; and stopping the backtracking when all possible variable combinations are produced that represent all possible valid schedules for the trace. All the possible schedules are analyzed to determine a schedule that produces the highest throughput of all the schedules.
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