首页> 外国专利> Method and apparatus for scheduling wafer processing within a multiple chamber semiconductor wafer processing tool having a multiple blade robot

Method and apparatus for scheduling wafer processing within a multiple chamber semiconductor wafer processing tool having a multiple blade robot

机译:在具有多刀片机器人的多室半导体晶片处理工具内调度晶片处理的方法和设备

摘要

Apparatus and concomitant method for performing priority-based scheduling of wafer processing within a multiple chamber semiconductor wafer processing system (cluster tool) having a dual blade wafer transfer mechanism. The sequencer assigns priority values to the chambers in a cluster tool, then moves wafers from chamber to chamber in accordance with the assigned priorities. The sequencer is capable of determining the amount of time available before a priority move is to be performed and, if time is sufficient, the sequencer performs a non- priority move while waiting. The sequencer also dynamically varies assigned priorities depending upon the availability of chambers in the tool. Lastly, the sequencer prioritizes the chambers based upon the minimum time required for the wafer transfer mechanism to move the wafers in a particular stage.
机译:用于在具有双刀片晶片传送机构的多腔室半导体晶片处理系统(集群工具)中执行晶片处理的基于优先级的调度的设备和伴随方法。定序器在群集工具中为腔室分配优先级值,然后根据分配的优先级在各个腔室之间移动晶圆。定序器能够确定在执行优先级移动之前可用的时间量,如果时间足够,定序器会在等待时执行非优先级移动。定序器还根据工具中腔室的可用性动态地改变分配的优先级。最后,定序器根据晶片传送机构在特定阶段移动晶片所需的最短时间来确定腔室的优先级。

著录项

  • 公开/公告号US6074443A

    专利类型

  • 公开/公告日2000-06-13

    原文格式PDF

  • 申请/专利权人 APPLIED MATERIALS INC.;

    申请/专利号US19980015726

  • 发明设计人 SRILAKSHMI VENKATESH;DUSAN JEVTIC;

    申请日1998-01-29

  • 分类号H01L21/77;H01L21/02;

  • 国家 US

  • 入库时间 2022-08-22 01:36:57

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号