首页> 外国专利> - ESD PROTECTION CIRCUIT OF SEMICONDUCTOR CONTROLLED RECTIFIER STRUCTURE CAPABLE OF OPERATING AT LOW TRIGGER VOLTAGE

- ESD PROTECTION CIRCUIT OF SEMICONDUCTOR CONTROLLED RECTIFIER STRUCTURE CAPABLE OF OPERATING AT LOW TRIGGER VOLTAGE

机译:-可在低触发电压下运行的半导体可控整流器结构的ESD保护电路

摘要

PURPOSE: An electrostatic discharge protection circuit having a structure of a semiconductor-controlled rectifier operated under a lower trigger voltage is provided to perform a protective function for an electrostatic discharge function by using the semiconductor-controlled rectifier. CONSTITUTION: The second conductive type well region(102) is formed on the first conductive type semiconductor substrate(101). The first to the third doped regions(103,104,105) are formed on the well region(102). The first doped region(102) is located between the second and the third doped regions(104,105). The first and the second doped regions(103,104) are electrically connected with a pad(106). The fourth doped region(107) is formed on the semiconductor substrate(101). The fifth doped region(108) is formed on the semiconductor substrate(101). The fourth and the fifth doped regions(107,108) are electrically connected with a ground voltage terminal(109). A switch circuit(110) is connected between the third doped region(105) and the ground voltage terminal(109). A plurality of NMOS transistors(M1 to Mi) are connected between the third doped region(105) and the ground voltage terminal(109).
机译:目的:提供具有在较低触发电压下操作的半导体控制整流器的结构的静电放电保护电路,以通过使用该半导体控制整流器来执行针对静电放电功能的保护功能。构成:第二导电类型阱区(102)形成在第一导电类型半导体衬底(101)上。在阱区(102)上形成第一至第三掺杂区(103、104、105)。第一掺杂区(102)位于第二和第三掺杂区(104,105)之间。第一和第二掺杂区(103,104)与焊盘(106)电连接。在半导体衬底(101)上形成第四掺杂区(107)。在半导体衬底(101)上形成第五掺杂区(108)。第四和第五掺杂区(107,108)与接地电压端子(109)电连接。开关电路(110)连接在第三掺杂区(105)和接地电压端子(109)之间。多个NMOS晶体管(M1至Mi)连接在第三掺杂区(105)和接地电压端子(109)之间。

著录项

  • 公开/公告号KR20030008988A

    专利类型

  • 公开/公告日2003-01-29

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20010044052

  • 发明设计人 SONG GI HWAN;

    申请日2001-07-21

  • 分类号H01L27/04;

  • 国家 KR

  • 入库时间 2022-08-21 23:47:53

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