首页> 外国专利> WIRING STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND OPTOELECTRONIC DEVICE, ELECTRONIC APPLIANCE

WIRING STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND OPTOELECTRONIC DEVICE, ELECTRONIC APPLIANCE

机译:布线结构,其制造方法以及光电装置,电子设备

摘要

PROBLEM TO BE SOLVED: To provide a wiring structure in which electrical connection between a lower side conductive layer constituting a part of a laminated body and conductive layers to be electrically connected thereto is suitably realized and to provide a method for manufacturing the same.;SOLUTION: The wiring structure comprises a condenser (20C) consisting of the lower side conductive layer (203), an insulating layer (202) formed thereon and an upper side conductive layer (201) formed thereon, a conductive layer (101) to be electrically connected to the lower side conductive layer and a junction layer (301) disposed on the lower layer side of both lower side conductive layer and conductive layer forming a part of a laminated structure and provided on a substrate (S). The lower side conductive layer and the conductive layer are electrically connected to each other via the junction layer.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种布线结构,其中适当地实现构成层叠体的一部分的下侧导电层与要电连接到其上的导电层之间的电连接,并提供一种用于制造该布线结构的方法。 :布线结构包括由下侧导电层(203),在其上形成的绝缘层(202)和在其上形成的上侧导电层(201)组成的电容器(20C),要电连接的导电层(101)连接到下侧导电层和连接层(301),该连接层设置在形成叠层结构的一部分的下侧导电层和导电层的下层侧上并设置在基板(S)上。下侧导电层和导电层通过结层彼此电连接。;版权所有:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004177589A

    专利类型

  • 公开/公告日2004-06-24

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20020342490

  • 发明设计人 MIYAZAKI TOSHIHIDE;OYAMADA SUSUMU;

    申请日2002-11-26

  • 分类号G02F1/1368;G09F9/30;H01L21/768;

  • 国家 JP

  • 入库时间 2022-08-21 23:31:27

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