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METHOD FOR INSPECTING SUBSTRATE FOR OPTOELECTRONIC DEVICE, METHOD FOR MANUFACTURING SUBSTRATE FOR OPTOELECTRONIC DEVICE, SUBSTRATE FOR OPTOELECTRONIC DEVICE, OPTOELECTRONIC DEVICE AND ELECTRONIC APPLIANCE
METHOD FOR INSPECTING SUBSTRATE FOR OPTOELECTRONIC DEVICE, METHOD FOR MANUFACTURING SUBSTRATE FOR OPTOELECTRONIC DEVICE, SUBSTRATE FOR OPTOELECTRONIC DEVICE, OPTOELECTRONIC DEVICE AND ELECTRONIC APPLIANCE
PROBLEM TO BE SOLVED: To provide a method for inspecting a substrate for an optoelectronic device by which physical properties of a transparent electrode in a non-flat part of a glass substrate including a protective film can be inspected in a manufacturing stage and excellent long-term reliability is obtained, to provide a method for manufacturing a substrate, and to provide an optoelectronic device and an electronic appliance.;SOLUTION: The method for inspecting a substrate for an optoelectronic device aims to evaluate physical properties of a transparent electrode formed on a the substrate for an optoelectronic device. The method includes: a transparent electrode forming step to form a transparent electrode 19 on a glass substrate including a protective film 215 formed in a portion corresponding to a display region on a glass substrate 13; and an evaluation step to evaluate the physical properties of a transparent electrode in a non-flat part 80 of the glass substrate 13 including a protective film 215 as well as to carry out an alkali acceleration test by using an alkali solution 90.;COPYRIGHT: (C)2005,JPO&NCIPI
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