首页> 外国专利> Film substrate, semiconductor device, method of manufacturing film substrate, method of manufacturing semiconductor device and method of manufacturing circuit board with semiconductor device

Film substrate, semiconductor device, method of manufacturing film substrate, method of manufacturing semiconductor device and method of manufacturing circuit board with semiconductor device

机译:膜基板,半导体装置,膜基板的制造方法,半导体装置的制造方法以及具有该半导体装置的电路基板的制造方法

摘要

Disclosed is a film substrate comprising an insulative sheet including a first region to be separated, having a slit on an outer peripheral line of the first region, and on which a semiconductor device chip is to be mounted, and a conductive pattern formed on the insulative sheet, crossing the slit, and to be connected to an external terminal of the semiconductor device chip.
机译:公开了一种膜基板,其包括:绝缘片,其包括待分离的第一区域;在第一区域的外周线上具有狭缝,并且要在其上安装半导体器件芯片;以及导电图案,该导电图案形成在绝缘片上。薄片穿过狭缝,并连接到半导体器件芯片的外部端子。

著录项

  • 公开/公告号US2005029635A1

    专利类型

  • 公开/公告日2005-02-10

    原文格式PDF

  • 申请/专利权人 TETSUYA YOKOI;

    申请/专利号US20040941908

  • 发明设计人 TETSUYA YOKOI;

    申请日2004-09-16

  • 分类号H01L23/495;

  • 国家 US

  • 入库时间 2022-08-21 22:22:14

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号