MASK PATTERN FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF FORMING THE SAME, METHOD OF PREPARING COATING COMPOSITION FOR FORMING FINE PATTERNS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

A mask pattern for semiconductor device fabrication is dislosed. A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymercomplex film formd on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor polymer and a proton acceptor polymer.