The present invention relates to a charter for immersion lithography defined compositions and methods using the same lithography, immersion lithography Prior to performing the process, by the water as a main component and a nonionic surfactant as an additive to clean the wafer by using the tablet charter composition comprising a compound of formula 1, the immersion lithography process carried out at the time of the immersion liquid composition for lithography be used as the pure water is a problem in that the supporting part or the concentrated liquid composition is filled completely and the fine resolution on the topology, the micro bubbles existing between the liquid composition and the photoresist pattern is removed. ; [ Formula 1] ; wherein, ; R is the main chain or side chain-substituted alkyl having 1 to 40, ; n is an integer selected from 10 to 10000.
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