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Optimization from Design Rules, Source and Mask, to Full Chip with a Single Computational Lithography Framework: Level-Set-Methods- based Inverse Lithography Technology (ILT)

机译:利用单一计算光刻框架优化从设计规则,源和掩模到全芯片:基于水平集方法的逆光刻技术(ILT)

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