A METHOD AND APPARATUS FOR ON-LINE MONITORING WAFER CLEANING SOLUTION AT SINGLE WAFER PROCESS AND A REAGENT CONTAINER FOR THE APPARATUS

摘要

A method for monitoring a wafer cleaning solution in an on-line manner in a single wafer process, a wafer cleaning solution on-line monitoring apparatus, and a reagent container for the same apparatus are provided to maintain stability in a measurement process by improving a measurement signal. A control unit maintains a standby state of a wafer cleaning solution on-line monitoring apparatus(S01). The control unit senses a starting state of a cleaning process of a single wafer processing apparatus(S02). The control unit operates the wafer cleaning solution on-line monitoring apparatus and obtains a cleaning solution sample from the single wafer processing apparatus(S03). The control unit measures density of a target material in the cleaning solution sample(S04). The wafer cleaning solution on-line monitoring apparatus performs an analysis process by using a sequential implant analysis method.