Device for the laser pulse deposition (pld) of layers on substrates

摘要

The invention relates to devices for the laser pulse deposition (pld) of layers, preferably of diamond-like carbon (dlc - layers) having a predominantly tetrahedral bonds (ta - c - layers) and cubic boron nitride films (c - bn - layers), to substrates with devices for vacuum generation, with at least one device for the ion beam - or plasma generation, with lasers with means for guiding, shaping, focusing and to the scanning of laser beams and with at least one transport device for at least one carrier.These are distinguished, in particular, characterized in that the layers can be produced predominantly free of stress.For this purpose, in each case at least one charging - / pre-treatment chamber, a coating chamber and a withdrawal chamber is arranged one after the, in each case via a device for vacuum generation separately to a high vacuum, as well as to be evacuated separately ventilated and separated from one another by means of vacuum locks, wherein in each case at least one carrier with at least one substrate holder for receiving at least one substrate by means of the conveying device in the open position of the air lock can be moved from chamber to chamber.