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Device for Pulsed Laser Deposition and a Substrate with a Substrate Surface for Reduction of Particles on the Substrate

机译:用于脉冲激光沉积的设备和具有衬底表面的衬底,用于减少衬底上的颗粒

摘要

The invention relates to a device for pulsed laser deposition and a substrate with a substrate surface, which device includes: a substrate holder for holding the substrate; a target arranged facing the substrate surface of the substrate; a velocity filter arranged between the substrate and the target; a pulsed laser directed onto the target at a target spot for generating a plasma plume of target material; and a plasma hole plate arranged between the target and the substrate. The plasma hole plate has a plasma passage opening divided in an upstream section and a downstream section by a dividing plane. The target spot coincides with the dividing plane, and the surface area of the upstream section is larger than the surface area of the downstream section.
机译:本发明涉及用于脉冲激光沉积的设备和具有衬底表面的衬底,该设备包括:用于保持衬底的衬底保持器;和用于保持衬底的衬底保持器。面对基板的基板表面布置的靶;在基板与靶材之间配置有速度滤波器。脉冲激光在目标点处对准目标,以产生目标材料的等离子体羽流;等离子体孔板设置在靶与基板之间。等离子体孔板具有在其上游区域和下游区域被划分平面划分的等离子体通过开口。目标点与分割平面一致,并且上游部分的表面积大于下游部分的表面积。

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