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The effects of the post-annealing time on the growth mechanism of Bi2Sr2Ca1Cu2O8+ thin films produced on MgO (100) single crystal substrates by pulsed laser deposition (PLD)

机译:后退火时间对通过脉冲激光沉积(PLD)在MgO(100)单晶衬底上生产的Bi2Sr2Ca1Cu2O8 +薄膜的生长机理的影响

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摘要

Bi2Sr2Ca1Cu2O8+δï thin films were deposited on MgO (100) substrates by pulsed laser deposition (PLD). The effects of post-annealing time on the phase formation, the structural and superconducting properties of the films have been investigated by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), temperature dependent resistivity (R-T), atomic force microscopy (AFM), and DC magnetization measurements. The films deposited at 600 °C were post-annealed in an atmosphere of a gas mixture of Ar (93%) and O2 (7%), at 860 °C for 10, 30, and 60 min. All films have demonstrated a mainly single phase of 2212 with a high crystallinity (FWHM0.159°) and c-axis oriented. The critical temperature, TC, of the films annealed for 10, 30, and 60 min were obtained as 77, 78, and 78 K, respectively. The highest critical current density, JC, was calculated as 3.34×107 A/cm2 for the film annealed at 860 °C for 30 min at 10 K.
机译:通过脉冲激光沉积(PLD)将Bi2Sr2Ca1Cu2O8 +δï薄膜沉积在MgO(100)衬底上。通过X射线衍射(XRD),扫描电子显微镜(SEM),温度相关电阻率(RT),原子力研究了退火后时间对薄膜相形成,结构和超导性能的影响。显微镜(AFM)和直流磁化强度测量。在860°C的Ar(93%)和O2(7%)的气体混合物的气氛中,将在600°C下沉积的薄膜后退火10、30和60分钟。所有膜均已证明具有高结晶度(FWHM0.159°)和c轴取向的2212单相。退火10、30和60分钟的薄膜的临界温度TC分别为77、78和78K。对于在860°C,10 K下退火30分钟的薄膜,最高临界电流密度JC计算为3.34×107 A / cm2。

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