APPARATUS FOR THE PULSED LASER DEPOSITION (PLD) OF LAYERS ON SUBSTRATES

摘要

The invention relates to apparatuses for the pulsed laser deposition (PLD) of layers, preferably of diamond-like carbon layers (DLC layers) having predominantly tetrahedral bonds (ta-C layers) and of cubic boron nitride layers (c-BN layers), on substrates using devices for generating a vacuum, comprising at least one device for ion beam or plasma generation, using lasers having devices for guiding, shaping, focusing and scanning laser beams, and at least one transport device for at least one carrier. These apparatuses are characterized particularly in that the layers can be produced predominantly without stress. For this purpose, at least one coating/pretreatment chamber, a coating chamber, and a removal chamber are disposed consecutively, which can each be separately evacuated up to high vacuum by means of a device for creating a vacuum, and can be separately vented, and are separated from each other by means of vacuum locks, wherein at least one carrier each comprising at least one substrate holder for receiving at least one substrate can be moved from chamber to chamber by means of the transport device when the vacuum lock is open.