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APPARATUS AND METHOD FOR MANUFACTURING HIGH TEMPERATURE SUPER-CONDUCTING THIN FILM USING PULSED LASER DEPOSITION(PLD) PROCESS
APPARATUS AND METHOD FOR MANUFACTURING HIGH TEMPERATURE SUPER-CONDUCTING THIN FILM USING PULSED LASER DEPOSITION(PLD) PROCESS
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机译:利用脉冲激光沉积(PLD)工艺制造高温超导薄膜的装置和方法
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摘要
PURPOSE: An apparatus and method for manufacturing a high temperature super-conducting thin film using a PLD(Pulsed Laser Deposition) process are provided to be capable of uniformly forming the thin film. CONSTITUTION: An apparatus for manufacturing a high temperature super-conducting thin film using a PLD process is provided with a vacuum chamber(23) for loading a substrate(26), a light source(21) for irradiating laser beam to a target, and an optical system(22) for transmitting the laser beam to the target by changing light path. The apparatus further includes a target driving part(25) for rotating the target and simultaneously moving the target to and fro. The optical system includes a plurality of mirrors and an attenuator.
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