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Synthesis of novel materials by pulsed laser deposition and chemical vapor deposition: Part I: Energetic deposition and stability of carbon nitride thin films. Part II: Catalytic growth of one dimensional materials and devices.

机译:通过脉冲激光沉积和化学气相沉积合成新型材料:第一部分:氮化碳薄膜的能量沉积和稳定性。第二部分:一维材料和装置的催化生长。

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The discovery and synthesis of new materials are often the driving forces for revolutionary scientific and technological advances. In this thesis, we report two aspects of our effort toward the synthesis of novel materials: the energetic deposition of carbon nitride thin films by pulsed laser deposition (PLD) and the catalytic synthesis of one dimensional materials and devices, including nanowires, nanotubes, and nanowire/nanotube hetero-junctions.; In the first part of the thesis, we discuss the synthesis and stability of sp3-hybridized carbon nitride thin films. We developed a novel process to synthesize carbon nitride thin films based on the mechanism of energetic deposition by using a combination of PLD and atomic nitrogen plasma. We first studied the mechanism of energetic deposition of diamond-like-carbon (DLC) by PLD, using the combination of TOF-MS and EELS measurements. These studies serve as the foundation for the synthesis of sp3-hybridized carbon nitride.; We then studied the deposition of carbon nitride thin films. The TOF-MS studies on laser plume in N2/He plasma showed that the concept of energetic deposition is applicable in our experiments and the kinetic energy of C+ should be high enough to produce highly sp3-hybridized carbon nitride. However, carbon nitride films with ∼40% nitrogen always contain essentially pure sp2-bonded carbon. Subsequent systematical studies on the effect of nitrogen on the local bonding revealed that there is a nitrogen-driven sp3 to sp2 relaxation when the nitrogen concentration increases from 11 to 17%. Theoretical studies on model structures using HF and DF theory calculations showed that there is a strong energetic preference for sp2 vs. sp3-bonded structure when the nitrogen concentration is larger than 12%.; In the second part of the thesis, we report the catalytic growth of one-dimensional (ID) materials and devices. We developed a general laser-ablation/chemical-vapor-deposition (LA-CVD) approach to synthesize nanowires and nanotubes. In this approach, nano-sized particles are generated by laser ablation first, and subsequently act as catalytic sites in the reactive background gases for nanowires or nanotubes to growth. Single crystalline Si nanowires (SiNWs) with diameters of several to tens of nanometers and lengths larger than 10 μm have been produced by ablating Au in silane gas. Structural properties of silicon nanowires and size-controlled growth are discussed. Single-walled nanotubes (SWNTs) and metal-filled multi-walled nanotubes (MWNTs) have also been produced by ablating Fe, Ni, Co, or iron oxide in ethylene gas. The experimental conditions for producing high yield, pure nanotubes are discussed.; We further used the catalytic approach in two different methods to synthesize nanojunctions of Si nanowires and carbon nanotubes. In the first method, a common iron based catalyst is used to grow SiNWs first by using LA-CVD, and then to grow MWNTs by using CVD method. Nanometer sized SiNW/MWNT junctions both with or without catalyst clusters at the joint are observed with TEM. In the second method, SiNWs are grown from a catalyst attached at the end of a nanotube tip. The electrical properties of the NT/NW junctions made by this method are measured by using the Ga-In liquid metal alloy to make contact to the free end of the junction. We found that the junctions exhibit rectifying behavior characteristic of a M/S Schottky diode.
机译:新材料的发现和合成通常是推动科学技术革命的动力。在本论文中,我们报告了我们在合成新型材料方面所做的努力的两个方面:通过脉冲激光沉积(PLD)进行的高能氮化碳薄膜沉积以及一维材料和器件的催化合成,包括纳米线,纳米管和纳米线。纳米线/纳米管异质结。在论文的第一部分,我们讨论了sp3-杂化氮化碳薄膜的合成和稳定性。我们结合PLD和原子氮等离子体,根据高能沉积机理,开发了一种合成氮化碳薄膜的新方法。我们首先结合TOF-MS和EELS测量研究了通过PLD进行类金刚石碳(DLC)能量沉积的机理。这些研究为合成sp 3 杂化氮化碳奠定了基础。然后,我们研究了氮化碳薄膜的沉积。 TOF-MS对N 2 / He等离子体中的激光羽流的研究表明,高能沉积的概念适用于我们的实验,C + 的动能应较高足以产生高度sp 3 杂化的氮化碳。但是,氮含量约为40%的氮化碳膜通常都含有基本上纯的sp 2 键合碳。随后的关于氮对局部键合影响的系统研究表明,当氮浓度从11%增至17%时,存在氮驱动的sp 3 至sp 2 弛豫。 。使用HF和DF理论计算对模型结构进行的理论研究表明,当氮浓度大于10%时,sp 2 与sp 3 键结构具有强烈的能量偏好。 12%。在论文的第二部分,我们报告了一维(ID)材料和器件的催化生长。我们开发了一种通用的激光烧蚀/化学气相沉积(LA-CVD)方法来合成纳米线和纳米管。在这种方法中,首先通过激光烧蚀产生纳米尺寸的颗粒,然后在反应本底气体中充当纳米线或纳米管生长的催化部位。通过在硅烷气体中烧蚀金,已经生产出直径为几纳米到几十纳米且长度大于10微米的单晶硅纳米线(SiNWs)。讨论了硅纳米线的结构特性和尺寸受控的增长。单壁纳米管(SWNT)和金属填充多壁纳米管(MWNT)也已经通过在乙烯气体中烧蚀铁,镍,钴或氧化铁而制得。讨论了生产高产率纯纳米管的实验条件。我们在两种不同的方法中进一步使用了催化方法来合成Si纳米线和碳纳米管的纳米结。在第一种方法中,首先使用普通的铁基催化剂通过使用LA-CVD来生长SiNW,然后使用CVD方法来生长MWNT。 TEM观察到纳米大小的SiNW / MWNT结在连接处有或没有催化剂簇。在第二种方法中,SiNW从附着在纳米管尖端末端的催化剂生长。通过使用Ga-In液态金属合金接触结的自由端,可以测量通过此方法制成的NT / NW结的电性能。我们发现,结表现出M / S肖特基二极管的整流行为特征。

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