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A method of manufacturing a semiconductor device with a transistor bulk and SOI transistors

机译:一种具有晶体管体和SOI晶体管的半导体器件的制造方法

摘要

By forming the transistor bulk form (151B) of the CMOS circuit of the SOI-based, the RAM area sensitive, RAM areas are formed based on the bulk transistor structure, or by increasing the width of the transistor From the hysteresis effect can be typically considered by the body connection is reduced, it is possible to save very effective chip area. Thus, the benefits of fast switching speed and, at the same time is kept to the speed-critical circuits such as the CPU core, RAM circuit may be formed in an efficient manner very space.
机译:通过形成基于SOI的CMOS电路的晶体管块体形式(151B),可以基于块体晶体管结构或通过增加晶体管的宽度来形成对RAM区域敏感的RAM区域。通常,磁滞效应可以是考虑到车身的连接减少了,可以节省非常有效的芯片面积。因此,具有快速切换速度的优点,并且同时保留了对速度至关重要的电路(例如CPU内核)的好处,可以以非常小的空间高效地形成RAM电路。

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