IN-LINE VIRTUAL-MASKING METHOD FOR MASKLESS LITHOGRAPHY

摘要

An inline virtual masking method for a maskless lithography is provided to prevent or reduce errors chemically generated with smudge and to realize the inline compensation of the deformation of a substrate without using a member for physical correction. An inline virtual masking method for a maskless lithography comprises an exposure hosting computer connection unit which produces and transmits a virtual mask for the exposure for the same pattern by inputting data necessary for the pattern exposure in a maskless lithographic process using micro-mirror; and a micro-mirror controller connection unit transmitting the beam of light to a micro-mirror controller by setting whether beam of light is reflected or not to micro-mirror with a virtual mask for the exposure, which it is transmitted from the exposure hosting computer connection unit.