METHOD FOR REPAIRING PHASE SHIFT ERROR ON PHASE SHIFT MASK

摘要

A method for correcting a phase shift error of a phase shift mask is provided to reduce a manufacturing cost by reducing a loss due to remanufacture of a phase shift mask. A phase shift pattern(200) is formed on a transparent substrate(100). An aerial image caused by a phase shift pattern is obtained by irradiating an exposure light source on a phase shift mask. A phase shift error and a position coordinate corresponding to the phase shift error are extracted by analyzing the aerial image. A laser light(400) is irradiated on an opposite surface of a front surface of a substrate having the phase shift pattern. A focus point of the laser light corresponds to a surface of an exposed substrate of a first error region. A surface(101) of the substrate is positioned in a distance closer than a chrome shading layer pattern(300) and the phase shift pattern from a light source of the laser light. The surface of the substrate is locally etched by the laser light. A local recess groove is formed on the surface of the substrate.