PAD CONDITIONING UNIT, CAPABLE OF REGENERATING A POLISHING PAD, A SUBSTRATE POLISHING APPARATUS INCLUDING THE SAME, AND A METHOD FOR REGENERATING A POLISHING PAD USING THE SAME

摘要

PURPOSE: A pad conditioning unit, a substrate polishing apparatus including the same, and a method for regenerating a polishing pad using the same are provided to improve the regenerating and cleaning efficiency of the polishing pad by maintaining the inside of a processing bath with a wet state during the regenerating process of the polishing pad.;CONSTITUTION: A polishing pad(311) is contained in a processing bath(810) during the regenerating process of the polishing pad. A diamond disk(830) is installed to be opposite to the bottom side of the processing bath. The diamond disk contacts with the surface of the polishing pad to implement a polishing operation. A plurality of wet nozzles(851, 852, 853, 854), which sprays cleaning fluid, is installed on both sidewalls of the processing bath.;COPYRIGHT KIPO 2010