首页> 外国专利> PAD CONDITIONING UNIT, A SUBSTRATE POLISHING APPARATUS INCLUDING THE SAME, AND A METHOD FOR RECYCLING A POLISHING PAD, CAPABLE OF IMPROVING THE RECYCLING EFFICIENCY OF THE POLISHING PAD

PAD CONDITIONING UNIT, A SUBSTRATE POLISHING APPARATUS INCLUDING THE SAME, AND A METHOD FOR RECYCLING A POLISHING PAD, CAPABLE OF IMPROVING THE RECYCLING EFFICIENCY OF THE POLISHING PAD

机译:垫调理单元,包括该垫调理设备的基质抛光设备以及一种回收抛光垫的方法,该方法能够提高抛光垫的回收效率

摘要

PURPOSE: A pad conditioning unit, a substrate polishing apparatus including the same, and a method for recycling a polishing pad are provided to improve the cleaning efficiency of the polishing pad by spraying cleaning fluid from downside toward the polishing surface of the polishing pad.;CONSTITUTION: A processing bath(610) receives a polishing pad(311) in a polishing pad recycling process. A recycling unit(620) is installed at the bottom surface of the processing bath. The recycling unit is in contact with the polishing pad and polishes the polishing surface of the polishing pad. A cleaning nozzle sprays cleaning fluid from downside toward the polishing surface of the polishing pad.;COPYRIGHT KIPO 2011
机译:目的:提供一种垫调节单元,包括该垫调节单元的基板抛光设备以及用于回收抛光垫的方法,以通过从清洁垫的下侧朝向抛光垫的抛光表面喷射清洁液来提高抛光垫的清洁效率。组成:处理池(610)在抛光垫回收过程中接收抛光垫(311)。在处理槽的底面安装有回收单元(620)。回收单元与抛光垫接触并抛光抛光垫的抛光表面。清洁喷嘴从下方向清洁垫的抛光表面喷射清洁液。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20110015994A

    专利类型

  • 公开/公告日2011-02-17

    原文格式PDF

  • 申请/专利权人 SEMES CO. LTD.;

    申请/专利号KR20090073477

  • 发明设计人 LEE SEUNG HO;CHOI KI HOON;

    申请日2009-08-10

  • 分类号H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:30

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