chemical etching method of a silicon substrate, chemically attacked silicon substrate, and rechargeable lithium cell

摘要

B CHEMICAL ATTACK METHOD OF A SILICON SUB STRATE, CHEMICALLY ATTACKED SILICON SUBSTRATE, E, RECHARGEABLE LITHIUM CELL D A method for the selective chemical attack of a silicon substrate on small local areas to form columns is described or pillars on the surface that has undergone a chemical attack. The silicon substrate is kept in a chemical attack solution of hydrogen fluoride, a silver salt and an alcohol. The inclusion of alcohol produces a higher agglomeration density of the silicon columns.