RESIST STRIPPER COMPOSITION CAPABLE OF EFFICIENTLY ELIMINATING RESIST AND ETCHING RESIDUE AFTER A DRYING ETCHING PROCESS

摘要

PURPOSE: A resist stripper composition is provided to smoothly implement manufacturing processes with respect to a plat display device with fine patterns and copper wiring by preventing the corrosion of metal wiring containing aluminum and/or copper.;CONSTITUTION: A resist stripper composition includes a basic compound represented by chemical formula 1, an amide compound represented by chemical formula 2, a polar solvent, and alkanol amine salt. In the chemical formulas, R1 to R3 is respectively an amino group substituted or non-substituted C1 to C10 alkyl group, a C2 to C1- alkenyl group, a C1 to C10 hydroxyalkyl group, a carboxyl group, or a C1 to C10 alkyl group substituted with a hydroxyl group substituted or non-substituted C1 to C10 alkoxy group. R4 to R6 is respectively a C1 to C10 alkyl group, C2 to C10 alkenyl group, a C1 to C10 hydroxyl alkyl group, a carboxyl group, a C1 to C10 alkoxy group substituted C1 to C10 alkyl group, or a C1 to C4 alkyl group substituted or non-substituted amino group. R5 and R6 are capable of forming a ring.;COPYRIGHT KIPO 2011