首页> 外国专利> NANO LIGHT EMITTING DIODES OR MICRO LIGHT EMITTING DIODES FABRICATED BY USING ION IMPLANTATION AND ITS FABRICATING METHOD, CAPABLE OF PREVENTING LIGHT LOSS DUE TO TOTAL INTERNAL REFLECTION

NANO LIGHT EMITTING DIODES OR MICRO LIGHT EMITTING DIODES FABRICATED BY USING ION IMPLANTATION AND ITS FABRICATING METHOD, CAPABLE OF PREVENTING LIGHT LOSS DUE TO TOTAL INTERNAL REFLECTION

机译:通过离子注入及其制造方法制造的纳米发光二极管或微发光二极管,能够防止由于内部反射而造成的光损失

摘要

PURPOSE: Nano light emitting diodes or micro light emitting diodes fabricated by using ion implantation and its fabricating method are provided to implement a nano light emitting diode by forming an insulating layer through ion implantation and plasma doping.;CONSTITUTION: In nano light emitting diodes or micro light emitting diodes fabricated by using ion implantation and its fabricating method, a nano structure is formed in an active area. The nano mask or a micro mask is formed in p-GaN. Ion implantation or plasma doping is performed in p-GaN by using reactive ions. A transparent electrode layer is formed on the p-GaN layer which is formed through the ion implantation or the plasma doping. An n electrode and a p electrode are formed on the transparent electrode layer.;COPYRIGHT KIPO 2012
机译:目的:提供通过离子注入制造的纳米发光二极管或微发光二极管及其制造方法,以通过离子注入和等离子体掺杂形成绝缘层来实现纳米发光二极管。通过离子注入及其制造方法制造的微型发光二极管,在有源区中形成纳米结构。在p-GaN中形成纳米掩模或微掩模。通过使用反应性离子在p-GaN中执行离子注入或等离子体掺杂。在通过离子注入或等离子体掺杂形成的p-GaN层上形成透明电极层。在透明电极层上形成n电极和p电极。; COPYRIGHT KIPO 2012

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