Plasma processing apparatus including multi-stacked dielecric window for uniform plasma density

摘要

PURPOSE: A plasma generating device having the plasma density uniform is the much dielectric window of the stack plate structure for improvement improves the plasma density uniformity of the reactor inside of the plasma generating device by using the dielectric window of the much layered structure. CONSTITUTION: A first dielectric window(301) has the thickness enduring the differential pressure of the inside of chamber of the chamber outside and vacuum atmosphere. A second dielectric window(302) is inserted into the first dielectric window. The second dielectric window is composed in order to laminate a plurality of secondary dielectric plates.