CHROMELESS PHASE SHIFT MASK AND METHOD FOR PRODUCING CHROMELESS PHASE SHIFT MASK

摘要

PROBLEM TO BE SOLVED: To provide a chromeless phase mask and a method for producing the chromeless phase mask that can improve CD performance significantly and can keep a light-shielding film on a non-engraved area with high accuracy.;SOLUTION: A chromeless phase shift mask includes a substrate that is transmissive to exposure light, and that has an engraved portion, where the substrate is engraved, and a non-engraved portion, where the substrate is not engraved, whereby the phase difference between light transmitted through the engraved portion and light transmitted through the non-engraved portion is controlled. A light-shielding film formed on the substrate includes: a film A that is formed on the substrate, where the transmittance and the phase shifting amount thereof with regard to the exposure light are controlled, and that is made of a material that can be etched by an etching process using an etching gas consisting essentially of a chlorine-based gas; and a film B that is formed on the film A, where the transmittance thereof with regard to the exposure light are controlled, and that is made of a material that can be etched by an etching process using an etching gas consisting essentially of a fluorine-based gas.;COPYRIGHT: (C)2012,JPO&INPIT