Chromeless phase shift mask for photomask blank, chromeless phase shift mask, and a chromeless phase shift mask production process for

摘要

PROBLEM TO BE SOLVED: To provide a chromeless phase shift mask that can significantly improve CD (Critical Dimension) performance, and to provide a method for manufacturing the mask.;SOLUTION: The chromeless phase shift mask has an engraved portion in a substrate transparent to exposure light so as to control phases of transmitted light, and is characterized in that a light shielding film provided in a portion adjacent to the engraved portion of the substrate or in a peripheral portion of the substrate includes a film (A) made of a material which can be etched in an etching process using an etching gas essentially comprising a fluorine-based gas.;COPYRIGHT: (C)2007,JPO&INPIT