ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR EXPOSURE BY X-RAY, ELECTRON BEAM OR EUV LIGHT AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition for exposure by x-ray, electron beam or EUV light that is excellent in pattern collapse margin and bridge margin with no residue of a resist composition on a substrate and excellent in resistance to scattered (flare) light, and a resist film and a pattern forming method using the composition.;SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition for exposure by x-ray, electron beam or EUV light comprises: (a) a compound that generates an acid expressed by the general formula (I) below by irradiation with actinic rays or radiation; and (b) a resin which contains (meth) acrylic acid ester structure unit having an aryl group in a side chain and exhibits increased solubility in an alkali developer by the action of an acid.;COPYRIGHT: (C)2012,JPO&INPIT