PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION USED FOR THE SAME, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE USING PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method for achieving small LWR (line width roughness), few development defects and excellent pattern profiles and CDU (critical dimension uniformity), and to provide an actinic ray-sensitive or radiation-sensitive resin composition used for the method, a resist film, and a method for manufacturing an electronic device and an electronic device using the pattern forming method, the resin composition and the resist film.;SOLUTION: The pattern forming method includes the steps of: (a) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing the following (A) to (C); (b) exposing the film; and (c) developing the exposed film by using a developing solution containing an organic solvent to form a negative pattern. The resin composition contains: (A) a resin in which the polarity is increased by an action of an acid and the solubility with a developing solution containing an organic solvent is decreased; (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) a compound having a cationic site and an anionic site within the same molecule, in which the cationic site and the anionic site are joined by a covalent bond.;COPYRIGHT: (C)2014,JPO&INPIT