ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND

摘要

The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R₁ and R₆ independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R₂ and R₅ independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R₃ and R₄ independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R₃ and R₄ may be bonded to each other to form a ring.;