首页> 外国专利> WRAP-AROUND CONTACTS FOR FINFET AND TRI-GATE DEVICES

WRAP-AROUND CONTACTS FOR FINFET AND TRI-GATE DEVICES

机译:FINFET和三栅极器件的绕线接触

摘要

A semiconductor device comprises a substrate and a semiconductor body formed on the substrate. The semiconductor body comprises a source region; and a drain region. The source region or the drain region, or combinations thereof, comprises a first side surface, a second side surface, and a top surface. The first side surface is opposite the second side surface, the top surface is opposite the bottom surface. The source region or the drain region, or combinations thereof, comprise a metal layer formed on the substantially all of the first side surface, substantially all of the second side surface, and the top surface.
机译:半导体器件包括衬底和形成在衬底上的半导体本体。半导体本体包括源极区;以及源极区。和漏区。源极区或漏极区或其组合包括第一侧表面,第二侧表面和顶表面。第一侧面与第二侧面相对,顶表面与底表面相对。源极区或漏极区或其组合包括形成在基本上所有第一侧面,基本上所有第二侧面和顶面上的金属层。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号