INTERFERENCE EXPOSING DEVICE, AN INTERFERENCE EXPOSING METHOD, AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE CAPABLE OF EASILY FORMING VARIOUS PATTERNS WITH LOW COSTS

摘要

PURPOSE: An interference exposing device, an interference exposing method, and a method for manufacturing a semiconductor device are provided to form a pattern variation of high degree of freedom with a sufficient focal depth.;CONSTITUTION: An optical path changing unit changes the direction and length of an optical path of a multi-luminous beam(1b) and includes a diffraction grating, a micromirror, and a prism. A pattern control unit changes the intensity or phase of the multi-luminous beam. The pattern control unit is composed of a plurality of shutters(30). A prism is installed between the pattern control unit and a wafer(WA).;COPYRIGHT KIPO 2013