METHOD FOR INSPECTING PATTERNS USING AN INTERFERENCE PHENOMENON OF A SUBSTRATE WHERE A PATTERN LAYER IS FORMED AND A PATTERN INSPECTING DEVICE, CAPABLE OF EFFICIENTLY INSPECTING PATTERNS AT LOW COSTS

摘要

PURPOSE: A method for inspecting patterns using an interference phenomenon of a substrate where a pattern layer is formed and a pattern inspecting device are provided to perform an inspection at draft precision resolution with high contrast, thereby enhancing the completeness of a display product.;CONSTITUTION: A method for inspecting patterns using an interference phenomenon of a substrate where a pattern layer is formed is as follows. Reflected light s cause by lights incident to the substrate where the pattern layer is formed at a predetermined incident angle are received(S11). A pattern domain where reinforcing interference or offsetting interference are generated or a reflection domain where the reinforcing interference or offsetting interference are not generated in raw images before a treatment are distinguished and respectively grouped so that inspection pattern images are generated(S12). The inspection pattern images are compared with reference pattern images so that the existence of the normality of the substrate is determined(S13).;COPYRIGHT KIPO 2013;[Reference numerals] (AA) Start; (BB) End; (S11) Irradiating an incident light of a predetermined incidence angle to a substrate with a pattern layer and receiving the reflected light; (S12) Distinguishing a pattern domain where reinforcing interference or offsetting interference are generated or a reflection domain where no interference is generated in an untreated raw image created from the received reflected light and grouping to create an inspection pattern image; (S13) Comparing the inspection pattern image with a reference pattern image and determining the normality of the substrate