首页> 外国专利> DEVICE FOR INSPECTING UPPER LAYER PATTERNS OF AN IMPROVE MULTILAYER STRUCTURE, A SYSTEM, AND A METHOD THEREOF, CAPABLE OF FACILITATING TO INSPECT DEFECTS OF UPPER LAYER PATTERNS WITH THE UNAIDED EYES

DEVICE FOR INSPECTING UPPER LAYER PATTERNS OF AN IMPROVE MULTILAYER STRUCTURE, A SYSTEM, AND A METHOD THEREOF, CAPABLE OF FACILITATING TO INSPECT DEFECTS OF UPPER LAYER PATTERNS WITH THE UNAIDED EYES

机译:用于检查改进的多层结构的上层图案的装置,系统和方法,其能够利用未辅助的眼睛来检查上层图案的缺陷

摘要

PURPOSE: A device for inspecting upper layer patterns of an improve multilayer structure, a system, and a method thereof are provided to utilize a difference of ultraviolet radiation amount of the upper layer electrode patterns and an insulating layer, thereby inspecting upper layer patterns accurately and precisely.;CONSTITUTION: A device(200) for inspecting upper layer patterns of an improve multilayer structure comprises an optical member(210), an ultraviolet-ray LED lighting member(220), and a camera(230). The ultraviolet-ray LED lighting member emits ultraviolet-rays. The ultraviolet-ray LED lighting member includes an illumination control member(250). The camera is arranged on the top of the optical member.;COPYRIGHT KIPO 2013
机译:目的:提供一种用于检查改进的多层结构的上层图案的装置,系统及其方法,以利用上层电极图案和绝缘层的紫外线辐射量的差异,从而准确地检查上层图案并组成:用于检查改进的多层结构的上层图案的装置(200)包括光学部件(210),紫外线LED照明部件(220)和照相机(230)。紫外线LED照明部件发出紫外线。紫外线LED照明部件包括照明控制部件(250)。相机布置在光学部件的顶部。COPYRIGHTKIPO 2013

著录项

  • 公开/公告号KR20130027906A

    专利类型

  • 公开/公告日2013-03-18

    原文格式PDF

  • 申请/专利权人 NARAENANOTECH CORPORATION;

    申请/专利号KR20110091431

  • 发明设计人 NAMGUNG KEE;HAN SUN GU;

    申请日2011-09-08

  • 分类号G01N21/956;G01N21/33;H01L21/66;

  • 国家 KR

  • 入库时间 2022-08-21 16:27:33

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