METHOD FOR INSPECTING AN ALIGNED STATE OF A MULTILAYER BY USING A DIFFRACTIVE LIGHT PATTERN ANALYSIS, SUITABLE FOR INSPECTING AN ALIGNED STATE OF LAYERS OF A PRECISE ELECTRONIC DEVICE WITH A MULTILAYER STRUCTURE

摘要

PURPOSE: A method for inspecting an aligned state of a multilayer by using a diffractive light pattern analysis is provided to obtain reflected lights reflected by an alignment mark by using a light source of a frequency band which is efficiently reacted to each layer and to easily detect the aligned state of a multilayer structure by detecting reflectance distribution.;CONSTITUTION: A method for inspecting an aligned state of a multilayer by using a diffractive light pattern analysis is as follows. A first layer(130) with a first alignment mark is arranged, and a second layer with a second alignment mark is arranged on the surface next above the first layer. When seeing above the second layer, the first and second alignment marks are arranged to be intersected. Measurement lights are incident into the first and second alignment marks, and patterns of reflected diffractive lights are obtained by using an image sensor thereafter. The patterns of the reflected diffractive lights are affected by the arrangement of the first and second alignment marks. The patterns of the diffractive lights are analyzed so that the aligned states of the first and second layers are inspected. The patterns of the diffractive lights are sorted into a reference pattern and a measurement pattern.;COPYRIGHT KIPO 2013