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Nonvolatile Charge Trap Memory Device Having a Deuterated Layer in a Multi-Layer Charge-Trapping Region

机译:在多层电荷陷阱区中具有氘化层的非易失性电荷陷阱存储器件

摘要

A nonvolatile charge trap memory device is described. The device includes a substrate having a channel region. A gate stack is disposed above the substrate over the channel region. The gate stack includes a multi-layer charge-trapping region having a first deuterated layer. The multi-layer charge-trapping region may further include a deuterium-free charge-trapping layer.
机译:描述了非易失性电荷陷阱存储装置。该装置包括具有沟道区的衬底。栅极堆叠设置在衬底上方的沟道区上方。栅极堆叠包括具有第一氘代层的多层电荷俘获区。多层电荷俘获区可以进一步包括无氘的电荷俘获层。

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