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Semiconductor device and method for manufacturing a semiconductor device having a maximal carrier concentration at multiple carrier concentration peak positions

机译:半导体器件和用于制造在多个载流子浓度峰值位置处具有最大载流子浓度的半导体器件的方法

摘要

A semiconductor device includes a semiconductor substrate having a collector layer in which the carrier concentration is maximized at a carrier concentration peak position that is 1 μm or more from a surface of the semiconductor substrate. The semiconductor device further includes a collector electrode formed in contact with a surface of the collector layer.
机译:半导体器件包括具有集电极层的半导体衬底,其中,在距半导体衬底的表面1μm以上的载流子浓度峰值位置处,载流子浓度最大化。半导体器件还包括形成为与集电极层的表面接触的集电极。

著录项

  • 公开/公告号US8614448B2

    专利类型

  • 公开/公告日2013-12-24

    原文格式PDF

  • 申请/专利权人 SHIGETO HONDA;

    申请/专利号US201113237577

  • 发明设计人 SHIGETO HONDA;

    申请日2011-09-20

  • 分类号H01L29/15;

  • 国家 US

  • 入库时间 2022-08-21 15:59:48

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